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Thermal stability of InGaAs/InGaAsP quantum wells

Authors :
Peyre, H.
Alsina, F.
Camassel, J.
Pascual, J.
Glew, R.W.
Source :
Journal of Applied Physics. April 15, 1993, Vol. 73 Issue 8, p3760, 9 p.
Publication Year :
1993

Abstract

The thermal stability of InGaAs/InGaAsP quantum wells was investigated by analyzing the influence of interdiffusion on the photoluminescence and Raman spectra. A blue shift which cannot be attributed solely to intermixing of the cationic species was observed. The structures remained lattice matched after annealing in the temperature range of 650 to 750 degres celsius. Thermal stability was observed up to a temperature of 650 degrees celsius.

Details

ISSN :
00218979
Volume :
73
Issue :
8
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.14058062