Feature-scale simulation of resist-patterned electrodeposition

Authors :: Dukovic, John O.
Source :: IBM Journal of Research and Development. March, 1993, Vol. v37 Issue n2, p125, 17 p.
Publication Year :: 1993

Subjects :: Metallurgy
Photolithography
Research and Development
Chemical engineering
Electrochemistry
Integrated circuit fabrication
Electroplating -- Innovations
Electroforming -- Research
Chemical engineering -- Research
Electrochemistry -- Research
Integrated circuit fabrication -- Methods

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