Interstitial oxygen reduction in silicon at thermal donor temperatures

MLA

Gusse, M. P., and R. Kleinhenz. “Interstitial Oxygen Reduction in Silicon at Thermal Donor Temperatures.” Journal of Applied Physics, vol. 72, no. 10, Nov. 1992, p. 4615. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.13856966&authtype=sso&custid=ns315887.

APA

Gusse, M. P., & Kleinhenz, R. (1992). Interstitial oxygen reduction in silicon at thermal donor temperatures. Journal of Applied Physics, 72(10), 4615.

Chicago

Gusse, M.P., and R. Kleinhenz. 1992. “Interstitial Oxygen Reduction in Silicon at Thermal Donor Temperatures.” Journal of Applied Physics 72 (10): 4615. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.13856966&authtype=sso&custid=ns315887.