High dose, heavy ion implantation into metals: the use of a sacrificial carbon surface layer for increased dose retention

The use of a sacrificial carbon surface layer deposited on the target surfaceto protect it from sputtering during a high dose heavy ion implantation processwas investigated. The results showed that the carbon layer effectively shieldedthe target from sputtering damage. However, as the implantation energy was increased, a significant degree of carbon mixing was observed at the C/Cu interface.