Growth of epitaxial {111} Ni(sub 0.82)Fe(sub 0.18)O and the exchange of anisotropy of Ni(sub 0.82)Fe(sub 0.18)O/Ni(sub 80)Fe(sub 20)

Authors :: Chih-Huang Lai
Wei-Chih Lien
White, Robert L.
Source :: Journal of Applied Physics. Jan 15, 2001, Vol. 89 Issue 2, 1302-1309
Publication Year :: 2001
Abstract: Epitaxial {111} NiFeO films were prepared by solid source metal-organic chemical vapor deposition (MOCVD) on {0001} ALPHA-Al(sub 2)O(sub 3). Structural and chemical analyses showed that NiFeO films were compositionally homogeneous.

Subjects :: Dielectric films -- Research
Thin films -- Research
Iron compounds -- Chemical properties
Nickel compounds -- Chemical properties
Epitaxy -- Research
Physics

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