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Electrical and microstructural characterization of molybdenum tungsten electrodes using a combinatorial thin film sputtering technique-
- Source :
- Journal of Applied Physics. March 1, 2005, Vol. 97 Issue 5, p054906-1, 6 p.
- Publication Year :
- 2005
-
Abstract
- A combinatorial rf magnetron sputter deposition technique was employed to investigate the electrical characteristics and microstructural properties of molybdenum tungsten (MoW) high temperature electrodes as a function of the binary composition. The effect of substrate bias and temperature was investigated.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 97
- Issue :
- 5
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.132262898