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SVGL to tie Micrascan II, SVG track, IBM resist under Sematech pact

Authors :
Dunn, Peter
Source :
Electronic News (1991). August 10, 1992, Vol. 38 Issue 1924, p13, 2 p.
Publication Year :
1992

Abstract

WILTON, CONN.--Under terms of a new Sematech contract, SVG Lithography Systems (SVGL) will set up a high-volume 'lithography cell' integrating its Micrascan II step-and-scan tool with a Silicon Valley Group […]

Details

Language :
English
ISSN :
10616624
Volume :
38
Issue :
1924
Database :
Gale General OneFile
Journal :
Electronic News (1991)
Publication Type :
Periodical
Accession number :
edsgcl.12580869