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Ion-to-CH3 flux ratio in diamond chemical-vapor deposition

Authors :
Teii, Kungen
Goto, Toshio
Hori, Masaru
Source :
Journal of Applied Physics. Oct 1, 2002, Vol. 92 Issue 7, 4103-4108
Publication Year :
2002

Abstract

The ion-to-CH3 flux ratio, ion energy and ionic composition in a low-pressure inductively coupled plasma (ICP) is examined by mass spectrometry with absolute calibration techniques. The specific surface process which is dominated by energetic ions is discussed.

Subjects

Subjects :
Plasma physics -- Research
Ions -- Research
Chemical vapor deposition -- Research
Physics

Details

Language :
English
ISSN :
00218979
Volume :
92
Issue :
7
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.125033999

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