Interdiffusion studies for HfSi (sub x) O (sub y) and ZrSi (sub x) O (sub y) on Si

Authors :: Quevedo-Lopez, M.A.
El-Bouanani, M.
Gnade, B.E.
Wallace, R.M
Douglas, M.
Bevan, M.J.
Visokay, M.R.
Colombo, L.
Source :: Journal of Applied Physics. Oct 1, 2002, Vol. 92 Issue 7, 3540-3550
Publication Year :: 2002
Abstract: Incorporation of metals into the silicon substrates after aggressive thermal annealing is studied. It is observed that Zr incorporation is more than Hf silicate incorporation.

Subjects :: Zirconium -- Thermal properties
Hafnium -- Thermal properties
Silicon -- Thermal properties
Physics

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