Reaction chemistry in the afterglow of an oxygen--helium, atmospheric-pressure plasma

Research was done on the reaction chemistry in the afterglow of oxygen in helium, which is studied, by ultraviolet absorption spectroscopy, optical emission spectroscopy and numerical modeling. In conclusion, the etching rate of polyimide correlated with the concentration of oxygen atoms in the afterglow, indicating that the O atoms were the active species involved in the process.