Back to Search
Start Over
Surface evolution of ultrahigh vacuum magnetron sputter deposited amorphous SiO2 thin films
- Source :
- Journal of Applied Physics. April 1, 2002, Vol. 91 Issue 7, 4082-4089
- Publication Year :
- 2002
-
Abstract
- The surface morphology evolution of amorphous SiO2 thin films deposited by ultrahigh vacuum radio frequency magnetron sputtering is studied by atomic force microscopy. The results show that the surface roughness of the deposited films reduced with increased substrate temperatures.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 91
- Issue :
- 7
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.123346556