Optical and structural properties of SiO(sub x)N(sub y)H(sub z) films deposited by electron cyclotron resonance and their correlation with composition

SiO(sub x)N(sub y)H(sub z) films were deposited from O2, N2, and SiH4 gas mixture at room temperature using the electron cyclotron resonance plasma method. The results show that the total density of defects in SiO(sub x)N(sub y)H(sub z) films are higher than in SiO2 and lower than in silicon nitride films.