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Fabrication and characterization of metal-semiconductor field-effect-transistor-type quantum devices

Authors :
Son, S. H.
Cho, K. H.
Hwaang, S. W.
Kim, K. M.
Park, Y. J.
Kim, W. Y.
Yu, Y. S.
Source :
Journal of Applied Physics. July 1, 2004, Vol. 96 Issue 1, 704-708
Publication Year :
2004

Abstract

A quantum dot transistors (QDT) and a nanowire transistor from a metal-semiconductor field-effect-transistors (MESFET)-type GaAs wafer was fabricated and characterized at low temperatures. The nanodevices showed a quantum mechanical effect like scanning electron microscope (SET) through excited states and negative differentail resistance (NDR).

Details

Language :
English
ISSN :
00218979
Volume :
96
Issue :
1
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.122433213