Back to Search Start Over

New surface imaging techniques for sub-0.5 micrometer optical lithography

Authors :
Calvert, Jeffrey M.
Dulcey, Charles S.
Peckerar, Martin C.
Schnur, Joel M.
Georger, Jr., Jacque H.
Calabrese, Gary S.
Sricharoenchaikit, Prasit
Source :
Solid State Technology. October, 1991, Vol. 34 Issue 10, p77, 6 p.
Publication Year :
1991

Abstract

In an optical lithography system, short wavelength (λ) sources and high numerical aperature (NA) lenses are desirable for fine feature printing, but can result in a depth of focus (DOF) […]

Subjects

Subjects :
Imaging technology
Electronics industry
Images, Optical -- Methods
Electronics industry -- Innovations -- Methods
Lithography -- Methods
Imaging systems -- Innovations

Details

Language :
English
ISSN :
0038111X
Volume :
34
Issue :
10
Database :
Gale General OneFile
Journal :
Solid State Technology
Publication Type :
Periodical
Accession number :
edsgcl.11551949

Tools

Authors Abstract Subjects Details