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Line and via voiding measurements in damascene copper lines using metal illumination

Authors :
Borden, Peter G.
Li, J.P.
Smith, Steven R.
Diebold, Alain C.
Chism, William Wesley, II
Source :
IEEE Transactions on Semiconductor Manufacturing. August, 2003, Vol. 16 Issue 3, p409, 8 p.
Publication Year :
2003

Abstract

New methods for monitoring via and line voiding in metal interconnect structures are described. A focused laser beam injects heat into a structure such as a line or via chain, which may have width considerably smaller than the spot size. Conduction of heat, and therefore temperature under the spot, is a function of via or line integrity. Probing the temperature using laser reflection provides a direct nondestructive measure of via continuity or line voiding. Index Terms--Copper interconnect, damascene copper, via, void.

Details

Language :
English
ISSN :
08946507
Volume :
16
Issue :
3
Database :
Gale General OneFile
Journal :
IEEE Transactions on Semiconductor Manufacturing
Publication Type :
Academic Journal
Accession number :
edsgcl.106863881