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Line and via voiding measurements in damascene copper lines using metal illumination
- Source :
- IEEE Transactions on Semiconductor Manufacturing. August, 2003, Vol. 16 Issue 3, p409, 8 p.
- Publication Year :
- 2003
-
Abstract
- New methods for monitoring via and line voiding in metal interconnect structures are described. A focused laser beam injects heat into a structure such as a line or via chain, which may have width considerably smaller than the spot size. Conduction of heat, and therefore temperature under the spot, is a function of via or line integrity. Probing the temperature using laser reflection provides a direct nondestructive measure of via continuity or line voiding. Index Terms--Copper interconnect, damascene copper, via, void.
Details
- Language :
- English
- ISSN :
- 08946507
- Volume :
- 16
- Issue :
- 3
- Database :
- Gale General OneFile
- Journal :
- IEEE Transactions on Semiconductor Manufacturing
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.106863881