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Resolving deep sub-wavelength scattering of nanoscale sidewalls using parametric microscopy
- Source :
- Journal of Electronic Science and Technology, Vol 19, Iss 3, Pp 100094- (2021)
- Publication Year :
- 2021
- Publisher :
- KeAi Communications Co., Ltd., 2021.
-
Abstract
- The quantitative optical measurement of deep sub-wavelength features with sub-nanometer sensitivity addresses the measurement challenge in the semiconductor fabrication process. Optical scatterings from the sidewalls of patterned devices reveal abundant structural and material information. We demonstrated a parametric indirect microscopic imaging (PIMI) technique that enables recovery of the profile of wavelength-scale objects with deep sub-wavelength resolution, based on measuring and filtering the variations of far-field scattering intensities when the illumination was modulated. The finite-difference time-domain (FDTD) numerical simulation was performed, and the experimental results were compared with atomic force microscopic (AFM) images to verify the resolution improvement achieved with PIMI. This work may provide a new approach to exploring the detailed structure and material properties of sidewalls and edges in semiconductor-patterned devices with enhanced contrast and resolution, compared with using the conventional optical microscopy, while retaining its advantage of a wide field of view and relatively low cost.
Details
- Language :
- English
- ISSN :
- 2666223X
- Volume :
- 19
- Issue :
- 3
- Database :
- Directory of Open Access Journals
- Journal :
- Journal of Electronic Science and Technology
- Publication Type :
- Academic Journal
- Accession number :
- edsdoj.f55d1c9f60f8454bbabc55327b1d93da
- Document Type :
- article
- Full Text :
- https://doi.org/10.1016/j.jnlest.2021.100094