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Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures
- Source :
- Micromachines, Vol 2, Iss 2, Pp 221-257 (2011)
- Publication Year :
- 2011
- Publisher :
- MDPI AG, 2011.
-
Abstract
- Research in recent years has greatly advanced the understanding and capabilities of multi-beam interference (MBI). With this technology it is now possible to generate a wide range of one-, two-, and three-dimensional periodic optical-intensity distributions at the micro- and nano-scale over a large length/area/volume. These patterns may be used directly or recorded in photo-sensitive materials using multi-beam interference lithography (MBIL) to accomplish subwavelength patterning. Advances in MBI and MBIL and a very wide range of applications areas including nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures are reviewed and put into a unified perspective.
Details
- Language :
- English
- ISSN :
- 2072666X
- Volume :
- 2
- Issue :
- 2
- Database :
- Directory of Open Access Journals
- Journal :
- Micromachines
- Publication Type :
- Academic Journal
- Accession number :
- edsdoj.9ee523273cc84f549cfd7e4937b304cd
- Document Type :
- article
- Full Text :
- https://doi.org/10.3390/mi2020221