Plasma Diagnostics of Argon-Oxygen Gases Mixture using Different Applied Power in a DC Sputtering System

Sputtering is the process of depositing thin films on the surface of a material using plasma. Plasma is created by adding extremely high energy to a surrounding gas, which turns into plasma. The plasma is directed towards the material on which you want to deposit the films, and the plasma particles interact with the material to form a thin film of the desired material. Oxygen plasma has many important applications in industry. When adding a small percentage of it, it can change the properties of the plasma significantly. In this research, the spectrum of the plasma generated from the application of different energies (175,200,250,300) watts of direct current was studied on a mixture of argon and oxygen gases in a ratio of (9: 1). The spectrum emitted from the plasma was measured Within the wavelength range (400-800) nm, the plasma parameters (Te, ne, λD, ND) were diagnosed by examining the spectrum corresponding to the applied power using optical emission spectroscopy (OES). The results showed an increase in the electron temperature and electron density with the increase in the applied power. Where the highest and lowest values for the electron temperature and density were respectively (1.645-1.305) eV, (26.03-25.36) x 1017/cm3.