Application of Computational Fluid Dynamics in Chemical Vapor Deposition Simulation

Chemical vapor deposition (CVD) technique is widely used in industrial production, but the products of CVD technique are influenced by many parameters. To determine how the changes of the parameters influence the deposition quality, repeated experiments are needed to be carried out. By introducing computational fluid dynamics (CFD) method into CVD realm for the numerical simulation of the CVD process, the overall research costs can be reduced and the efficiency of deposition can be improved effectively. In this paper, the conception of computational fluid dynamics was briefly introduced, and then the analysis methods of CFD simulation were described with the instance of ANSYS Fluent software. Finally, the applications of CFD method in the establishment of research models of CVD reactions, structural improvement of CVD reactors and optimization of CVD technique were reviewed respectively.