Multi-Layer Anti-Reflection Film Based on SiOx and NbOx by DC Pulse Sputter System with Inductively Coupled Plasma Source

MLA

Hanbin Lee, et al. “Multi-Layer Anti-Reflection Film Based on SiOx and NbOx by DC Pulse Sputter System with Inductively Coupled Plasma Source.” Crystals, vol. 10, no. 6, May 2020, p. 424. EBSCOhost, https://doi.org/10.3390/cryst10060424.

APA

Hanbin Lee, Minjeong Park, Minhyon Jeon, & Byeongcheol Kim. (2020). Multi-Layer Anti-Reflection Film Based on SiOx and NbOx by DC Pulse Sputter System with Inductively Coupled Plasma Source. Crystals, 10(6), 424. https://doi.org/10.3390/cryst10060424

Chicago

Hanbin Lee, Minjeong Park, Minhyon Jeon, and Byeongcheol Kim. 2020. “Multi-Layer Anti-Reflection Film Based on SiOx and NbOx by DC Pulse Sputter System with Inductively Coupled Plasma Source.” Crystals 10 (6): 424. doi:10.3390/cryst10060424.