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A New Approach for the Control and Reduction of Warpage and Residual Stresses in Bonded Wafer

Authors :
Seyed Amir Fouad Farshchi Yazdi
Matteo Garavaglia
Aldo Ghisi
Alberto Corigliano
Source :
Micromachines, Vol 12, Iss 4, p 361 (2021)
Publication Year :
2021
Publisher :
MDPI AG, 2021.

Abstract

A geometrical modification on silicon wafers before the bonding process, aimed to decrease (1) the residual stress caused by glass frit bonding, is proposed. Finite element modeling showed that (2) by introducing this modification, the wafer out-of-plane deflection was decreased by 34%. Moreover, (3) fabricated wafers with the proposed geometrical feature demonstrated an improvement for the (4) warpage with respect to the plain wafers. A benefit for curvature variation and overall shape of the (5) bonded wafers was also observed.

Details

Language :
English
ISSN :
2072666X
Volume :
12
Issue :
4
Database :
Directory of Open Access Journals
Journal :
Micromachines
Publication Type :
Academic Journal
Accession number :
edsdoj.74aec314cf8427bbb613bc71e3f379e
Document Type :
article
Full Text :
https://doi.org/10.3390/mi12040361