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Controlled Synthesis and Growth Mechanism of Two-Dimensional Zinc Oxide by Surfactant-Assisted Ion-Layer Epitaxy
- Source :
- Crystals, Vol 13, Iss 1, p 5 (2022)
- Publication Year :
- 2022
- Publisher :
- MDPI AG, 2022.
-
Abstract
- Two-dimensional (2D) zinc oxide (ZnO) has attracted much attention for its potential applications in electronics, optoelectronics, ultraviolet photodetectors, and resistive sensors. However, little attention has been focused on the growth mechanism, which is highly desired for practical applications. In this paper, the growth mechanism of 2D ZnO by surfactant-assisted ion-layer epitaxy (SA-ILE) is explored by controlling the amounts of surfactant, temperature, precursor concentration, and growth time. It is found that the location and the number of nucleation sites at the initial stages are restricted by the surfactant, which absorbs Zn2+ ions via electrostatic attraction at the water-air interface. Then, the growth of 2D ZnO is administered by the temperature, precursors, and growth time. In other words, the temperature is connected with the diffusion of solute ions and the number of nucleation sites. The concentration of precursors determines the solute ions in solution, which plays a dominant role in the growth rate of 2D ZnO, while growth time affects the nucleation, growth, and dissolution processes of ZnO. However, if the above criteria are exceeded, the nucleation sites significantly increase, resulting in multiple 2D ZnO with tiny size and multilayers. By optimizing the above parameters, 2D ZnO nanosheets with a size as large as 20 μm are achieved with 10 × 10−5 of the ratio of sodium oleyl sulfate to Zn2+, 70 °C, 50 mM of precursor concentration, and 50 min of growth time. 2D ZnO sheets, are confirmed by scanning electron microscope (SEM), energy-dispersive X-ray spectrometer (EDS), X-ray photoelectron spectroscopy (XPS), and Raman spectrum. Our work might guide the development of SA-ILE and pave the platform for practical applications of 2D ZnO on photodetectors, sensors, and resistive switching devices.
Details
- Language :
- English
- ISSN :
- 20734352
- Volume :
- 13
- Issue :
- 1
- Database :
- Directory of Open Access Journals
- Journal :
- Crystals
- Publication Type :
- Academic Journal
- Accession number :
- edsdoj.7459f8118d314a0cb1778669e833992a
- Document Type :
- article
- Full Text :
- https://doi.org/10.3390/cryst13010005