Structural and morphological dataset for rf-sputtered WC-Co thin films using synchrotron radiation methods

Control and manipulation of synthesis parameters of thin film coatings is of critical concern in determination of material properties and performance. Structural and morphological properties of rf-sputtered WC-Co thin films deposited under varying deposition parameters namely, substrate temperature and rf power are presented in this data article. The surface morphology, crystallite size and nature were acquired using x-ray photoelectron spectroscopy (XPS) and Grazing Incidence X-ray absorption spectroscopy (GI-XAS). Furthermore, Synchrotron findings are correlated with complimentary data acquired from Scanning electron microscopy (SEM), Raman spectroscopy and surface profilometry to predict and point out optimum synthesis parameters for best properties of the film. Keywords: WC-Co thin films, X-ray photoelectron spectroscopy (XPS), Grazing incidence X-ray absorption spectroscopy (GI-XAS), Synchrotron radiation, SEM