Performance Investigation of Single Grain Boundary Junctionless Field Effect Transistor

In this paper, we report a single grain boundary (GB) junctionless thin film transistor (JLFET) on recrystallized polycrystalline silicon (poly-Si JLFET). Using 2-D simulations, the electrical performance of the poly-Si JLFET is evaluated for different single GB locations in the channel. Without the need for creating the source and the drain regions by implantation, we demonstrate the prospect of achieving thin-film poly-Si JLFETs whose performance is reasonable for silicon film thicknesses less than 10 nm.