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Enhancement of remnant polarization in ferroelectric HfO2 thin films induced by mechanical uniaxial tensile strain after the crystallization process
- Source :
- Applied Physics Express, Vol 17, Iss 5, p 051003 (2024)
- Publication Year :
- 2024
- Publisher :
- IOP Publishing, 2024.
-
Abstract
- The effect of strain on the ferroelectricity of HfO _2 thin films after crystallization was investigated by applying uniaxial mechanical strains to Au/HfO _2 /TiN metal–ferroelectric–metal (MFM) capacitors. The remnant polarization (2 P _r ) of MFM capacitors increased when tensile strain was applied during polarization switching. This phenomenon should not be attributed to phase transformation from the non-ferroelectric to the ferroelectric phase, taking account of the fast relaxation of 2 P _r after removal of the mechanical strain and the fact that the crystal structure of HfO _2 thin films evaluated by grazing incidence X-ray diffraction measurement was not changed by the tensile strain.
Details
- Language :
- English
- ISSN :
- 18820786
- Volume :
- 17
- Issue :
- 5
- Database :
- Directory of Open Access Journals
- Journal :
- Applied Physics Express
- Publication Type :
- Academic Journal
- Accession number :
- edsdoj.46335c877c6b40579d2e920f84de4f89
- Document Type :
- article
- Full Text :
- https://doi.org/10.35848/1882-0786/ad379a