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Wide band UV/Vis/NIR blazed-binary reflective gratings for spectro-imagers: two lithographic technologies investigation

Authors :
Lee Mane-Si Laure
Cholet Julie
Delboulbé Anne
Guillemet Raphaël
Loiseaux Brigitte
Garabédian Patrick
Flügel-Paul Thomas
Benkenstein Tino
Sadlowski Susann
Tetaz Nicolas
Windpassinger Roman
Mateo Ana Baselga
Source :
Journal of the European Optical Society-Rapid Publications, Vol 19, Iss 1, p 7 (2023)
Publication Year :
2023
Publisher :
EDP Sciences, 2023.

Abstract

We report on subwavelength reflective gratings for hyperspectral applications operating in a very large spectral band (340–1040 nm). Our study concerns a blazed-binary grating having a period of 30 μm and composed of 2D subwavelength structures with size from 120 nm to 350 nm. We demonstrate the manufacturing of the gratings on 3″ wafers by two lithography technologies (e-beam and nanoimprint) followed by classical dry etching process. Optical measurements show that the subwavelength grating approach enables a broadband efficiency, polarization behaviour and wavefront quality improvement with respect to the requirements for the next generation of spectro-imagers for Earth observation missions. An outlook towards spherical substrate based on nanoimprint lithography is also reported with the results of mixed features replication (holes and pillars in the range of 160–330 nm) on a 540 mm concave substrate which demonstrate uniformity and accuracy capabilities over 3″ surface.

Details

Language :
English
ISSN :
19902573
Volume :
19
Issue :
1
Database :
Directory of Open Access Journals
Journal :
Journal of the European Optical Society-Rapid Publications
Publication Type :
Academic Journal
Accession number :
edsdoj.3a16aabbe4bc41f4ae3ad0919740b015
Document Type :
article
Full Text :
https://doi.org/10.1051/jeos/2023004