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High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)

Authors :
Rongbo Wu
Lang Gao
Youting Liang
Yong Zheng
Junxia Zhou
Hongxin Qi
Difeng Yin
Min Wang
Zhiwei Fang
Ya Cheng
Source :
Micromachines, Vol 13, Iss 3, p 378 (2022)
Publication Year :
2022
Publisher :
MDPI AG, 2022.

Abstract

Integrated thin-film lithium niobate (LN) electro-optic (EO) modulators of broad bandwidth, low insertion loss, low cost and high production rate are essential elements in contemporary interconnection industries and disruptive applications. Here, we demonstrated the design and fabrication of a high performance thin-film LN EO modulator using photolithography assisted chemo-mechanical etching (PLACE) technology. Our device shows a 3-dB bandwidth over 50 GHz, along with a comparable low half wave voltage-length product of 2.16 Vcm and a fiber-to-fiber insertion loss of 2.6 dB. The PLACE technology supports large footprint, high fabrication uniformity, competitive production rate and extreme low device optical loss simultaneously, our result shows promising potential for developing high-performance large-scale low-loss photonic integrated devices.

Details

Language :
English
ISSN :
2072666X and 01424785
Volume :
13
Issue :
3
Database :
Directory of Open Access Journals
Journal :
Micromachines
Publication Type :
Academic Journal
Accession number :
edsdoj.2c57d43e01424785b9d72f42628d5523
Document Type :
article
Full Text :
https://doi.org/10.3390/mi13030378