Atomic Layer Deposition for Preparing Isolated Co Sites on SiO2 for Ethane Dehydrogenation Catalysis

MLA

Renjing Huang, et al. “Atomic Layer Deposition for Preparing Isolated Co Sites on SiO2 for Ethane Dehydrogenation Catalysis.” Nanomaterials, vol. 10, no. 2, Jan. 2020, p. 244. EBSCOhost, https://doi.org/10.3390/nano10020244.

APA

Renjing Huang, Yuan Cheng, Yichen Ji, & Raymond J. Gorte. (2020). Atomic Layer Deposition for Preparing Isolated Co Sites on SiO2 for Ethane Dehydrogenation Catalysis. Nanomaterials, 10(2), 244. https://doi.org/10.3390/nano10020244

Chicago

Renjing Huang, Yuan Cheng, Yichen Ji, and Raymond J. Gorte. 2020. “Atomic Layer Deposition for Preparing Isolated Co Sites on SiO2 for Ethane Dehydrogenation Catalysis.” Nanomaterials 10 (2): 244. doi:10.3390/nano10020244.