Construction of porous diamond film with enhanced electric double-layer capacitance via regrowth of diamond nanoplatelets

The engineering of porous boron-doped diamond (BDD) film has sparked significant interest in improving electric double-layer (EDL) capacitance. However, the presence of disordered and tortuous pores in the BDD film hinders the accessibility of the bottom pore surface area, leading to a decrease in specific EDL capacitance. Herein, a novel porous BDD film with vertically open pore channels is constructed through the overcoating of diamond nanoplatelet template with a BDD layer using chemical vapor deposition. Electrochemical investigations manifest that the specific areal EDL capacitance of the porous BDD is ∼428 times greater than that of the planar BDD film. More impressively, the porous BDD film demonstrates a higher specific volumetric EDL capacitance (39.30 F/cm3) and superior long-term stability (100% capacitance retention after 12,000 cycles), surpassing the performance of most developed porous BDD electrodes. The exceptional performance of the porous BDD film was attributed to the abundant vertically open pore channels, good hydrophilic property, maximized electrochemical available area, and good chemical/mechanical stability. This work benefits the development of the BDD film as an EDL micro-capacitor electrode, and the methodology proposed here shows great potentials to fabricate an ordered porous BDD nanostructure with large specific area for more electrochemical applications.