Stochastic Processes Applied to Line Shapes

We present approaches using stochastic processes for the calculation of line broadening in plasmas. The derivation of model microfield methods (MMM) based on analytic formulations is recalled, as well as an approach using a simulation of the stochastic process. We discuss the possibility of an improvement of the stochastic process by comparing our first results to ab initio particle simulations coupled to a numerical integration of the emitters Schrödinger equation.