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An InGaAs/InP DHBT With Simultaneous $\text{f}_{\boldsymbol \tau }/\text{f}_{\text {max}}~404/901$ GHz and 4.3 V Breakdown Voltage

Authors :
Johann C. Rode
Han-Wei Chiang
Prateek Choudhary
Vibhor Jain
Brian J. Thibeault
William J. Mitchell
Mark J. W. Rodwell
Miguel Urteaga
Dmitri Loubychev
Andrew Snyder
Ying Wu
Joel M. Fastenau
Amy W. K. Liu
Source :
IEEE Journal of the Electron Devices Society, Vol 3, Iss 1, Pp 54-57 (2015)
Publication Year :
2015
Publisher :
IEEE, 2015.

Abstract

We report an InP/InGaAs/InP double heterojunction bipolar transistor fabricated in a triple-mesa structure, exhibiting simultaneous 404 GHz fτ and 901 GHz fmax. The emitter and base contacts were defined by electron beam lithography with better than 10 nm resolution and smaller than 20 nm alignment error. The base-collector junction has been passivated by depositing a SiNx layer prior to benzocyclobutene planarization, improving the open-base breakdown voltage BVCEO from 3.7 to 4.3 V.

Details

Language :
English
ISSN :
21686734
Volume :
3
Issue :
1
Database :
Directory of Open Access Journals
Journal :
IEEE Journal of the Electron Devices Society
Publication Type :
Academic Journal
Accession number :
edsdoj.098c582ddff437b956a73d2d10dfe66
Document Type :
article
Full Text :
https://doi.org/10.1109/JEDS.2014.2363178