Laser diagnosis and computer modelling of C/H/O and C/H/N plasmas used in diamond chemical vapour deposition

Laser and optical emission spectroscopies have been employed to study the gas phase chemistry in the growth environment for diamond chemical vapour deposition (CVO) in a microwave (MW) reactor. Computational investigations have also been used to explore the energetics of elementary reactions on a diamond surface, to give insight into which species are likely to incorporate into a growing diamond film. The focus of this thesis is on 0 and N containing CIH plasmas.