Dual Operation of Gate-All-Around Silicon Nanowires at Cryogenic Temperatures: FET and Quantum Dot

As CMOS structures are envisioned to host silicon spin qubits, and for co-integrating quantum systems with their classical control blocks, the cryogenic behaviour of such structures need to be investigated. In this paper we characterize the electrical properties of Gate-All-Around (GAA) n-MOSFETs Si nanowires (NWs) from room temperature down to 1.7 K. We demonstrate that those devices can operate both as transistor and host quantum dots at cryogenic temperature. In the classical regime of the transistor we show improved performances of the devices and in the quantum regime we show systematic quantum dots formation in GAA devices.
Comment: 4 pages, 4 figures