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Electron spin transport in a metal-oxide-semiconductor Si two-dimensional inversion channel: Effect of hydrogen annealing on spin scattering mechanism and spin lifetime

Authors :
Sato, Shoichi
Tanaka, Masaaki
Nakane, Ryosho
Publication Year :
2022

Abstract

Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan Center for Spintronics Research Network (CSRN), The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan<br />Comment: 26 pages, 5 figures, 1 table

Subjects

Subjects :
Physics - Applied Physics

Details

Database :
arXiv
Publication Type :
Report
Accession number :
edsarx.2208.01798
Document Type :
Working Paper