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Tailoring high-TN interlayer antiferromagnetism in a van der Waals itinerant magnet

Authors :
Seo, Junho
An, Eun Su
Park, Taesu
Hwang, Soo-Yoon
Kim, Gi-Yeop
Song, Kyung
Oh, Eunseok
Choi, Minhyuk
Watanabe, Kenji
Taniguchi, Takashi
Jo, Youn Jung
Yeom, Han Woong
Choi, Si-Young
Shim, Ji Hoon
Kim, Jun Sung
Publication Year :
2020

Abstract

Antiferromagnetic (AFM) van der Waals (vdW) materials provide a novel platform for synthetic AFM spintronics, in which the spin-related functionalities are derived from manipulating spin configurations between the layers. Metallic vdW antiferromagnets are expected to have several advantages over the widely-studied insulating counterparts in switching and detecting the spin states through electrical currents but have been much less explored due to the lack of suitable materials. Here, utilizing the extreme sensitivity of the vdW interlayer magnetism to material composition, we report the itinerant antiferromagnetism in Co-doped Fe4GeTe2 with TN ~ 210 K, an order of magnitude increased as compared to other known AFM vdW metals. The resulting spin configurations and orientations are sensitively controlled by doping, magnetic field, temperature, and thickness, which are effectively read out by electrical conduction. These findings manifest strong merits of metallic vdW magnets with tunable interlayer exchange interaction and magnetic anisotropy, suitable for AFM spintronic applications.<br />Comment: 19 pages, 4 figures, submitted

Details

Database :
arXiv
Publication Type :
Report
Accession number :
edsarx.2004.12650
Document Type :
Working Paper