Cite
Electromagnetic Field Tapering in the High-Roughness Substrates Coated by a Thin Film of Manganese: A Lithography-Free Approach to Ultra-Broadband, Wide-Angle, UV to FIR Perfect Absorption
MLA
Aalizadeh, Majid, et al. Electromagnetic Field Tapering in the High-Roughness Substrates Coated by a Thin Film of Manganese: A Lithography-Free Approach to Ultra-Broadband, Wide-Angle, UV to FIR Perfect Absorption. 2018. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsarx&AN=edsarx.1812.01987&authtype=sso&custid=ns315887.
APA
Aalizadeh, M., Tavakol, M. R., Khavasi, A., Yilmaz, M., & Ozbay, E. (2018). Electromagnetic Field Tapering in the High-Roughness Substrates Coated by a Thin Film of Manganese: A Lithography-Free Approach to Ultra-Broadband, Wide-Angle, UV to FIR Perfect Absorption.
Chicago
Aalizadeh, Majid, Mohammad Reza Tavakol, Amin Khavasi, Mehmet Yilmaz, and Ekmel Ozbay. 2018. “Electromagnetic Field Tapering in the High-Roughness Substrates Coated by a Thin Film of Manganese: A Lithography-Free Approach to Ultra-Broadband, Wide-Angle, UV to FIR Perfect Absorption.” http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsarx&AN=edsarx.1812.01987&authtype=sso&custid=ns315887.