Back to Search
Start Over
A 1.6:1 Bandwidth Two-Layer Antireflection Structure for Silicon Matched to the 190-310 GHz Atmospheric Window
- Source :
- Appl. Opt. 57, 5196-5209 (2018)
- Publication Year :
- 2018
-
Abstract
- Although high-resistivity, low-loss silicon is an excellent material for THz transmission optics, its high refractive index necessitates antireflection treatment. We fabricated a wide-bandwidth, two-layer antireflection treatment by cutting subwavelength structures into the silicon surface using multi-depth deep reactive ion etching (DRIE). A wafer with this treatment on both sides has <-20 dB (<1%) reflectance over 190-310 GHz. We also demonstrated that bonding wafers introduces no reflection features above the -20 dB level, reproducing previous work. Together these developments immediately enable construction of wide-bandwidth silicon vacuum windows and represent two important steps toward gradient-index silicon optics with integral broadband antireflection treatment.<br />Comment: Accepted for publication in Applied Optics
- Subjects :
- Astrophysics - Instrumentation and Methods for Astrophysics
Subjects
Details
- Database :
- arXiv
- Journal :
- Appl. Opt. 57, 5196-5209 (2018)
- Publication Type :
- Report
- Accession number :
- edsarx.1803.05168
- Document Type :
- Working Paper
- Full Text :
- https://doi.org/10.1364/AO.57.005196