Multi-objective Optimizations of a Normal Conducting RF Gun Based Ultra Fast Electron Diffraction Beamline

We present the results of multi-objective genetic algorithm optimizations of a potential single shot ultra fast electron diffraction beamline utilizing a 100 MV/m 1.6 cell normal conducting rf (NCRF) gun, as well as a 9 cell 2pi/3 bunching cavity placed between two solenoids. Optimizations of the transverse projected emittance as a function of bunch charge are presented and discussed in terms of the scaling laws derived in the charge saturation limit. Additionally, optimization of the transverse coherence length as a function of final rms bunch length at the sample location have been performed for a charge of 1e6 electrons. Analysis of the solutions is discussed, as are the effects of disorder induced heating. In particular, for a charge of $10^6$ electrons and final beam size greater than or equal to 25 microns, we found a relative coherence length of 0.07, 0.1, and 0.2 nm/micron for a final bunch length of approximately 5, 30, and 100 fs, respectively. These results demonstrate the viability of using genetic algorithms in the design and operation of ultrafast electron diffraction beamlines.
Comment: arXiv admin note: substantial text overlap with arXiv:1510.07738