Back to Search
Start Over
Superconducting properties of very high quality NbN thin films grown by high temperature chemical vapor deposition
- Source :
- Supercond. Sci. Technol. 29, 105011 (2016)
- Publication Year :
- 2016
-
Abstract
- Niobium nitride (NbN) is widely used in high-frequency superconducting electronics circuits because it has one of the highest superconducting transition temperatures ($T_c$ $\sim$ 16.5 K) and largest gap among conventional superconductors. In its thin-film form, the $T_c$ of NbN is very sensitive to growth conditions and it still remains a challenge to grow NbN thin film (below 50 nm) with high $T_c$. Here, we report on the superconducting properties of NbN thin films grown by high-temperature chemical vapor deposition (HTCVD). Transport measurements reveal significantly lower disorder than previously reported, characterized by a Ioffe-Regel ($k_F$$\ell$) parameter of $\sim$ 14. Accordingly we observe $T_c$ $\sim$ 17.06 K (point of 50% of normal state resistance), the highest value reported so far for films of thickness below 50 nm, indicating that HTCVD could be particularly useful for growing high quality NbN thin films.
- Subjects :
- Condensed Matter - Superconductivity
Subjects
Details
- Database :
- arXiv
- Journal :
- Supercond. Sci. Technol. 29, 105011 (2016)
- Publication Type :
- Report
- Accession number :
- edsarx.1603.09635
- Document Type :
- Working Paper
- Full Text :
- https://doi.org/10.1088/0953-2048/29/10/105011