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Band Structure of EuO/Si Spin Contact: Justification for Silicon Spintronics

Authors :
Lev, Leonid L.
Averyanov, Dmitry V.
Tokmachev, Andrey M.
Bisti, Federico
Rogalev, Victor A.
Strocov, Vladimir N.
Storchak, Vyacheslav G.
Publication Year :
2016

Abstract

Silicon spintronics requires injection of spin-polarized carriers into Si. An emerging approach is direct electrical injection from a ferromagnetic semiconductor - EuO being the prime choice. Functionality of the EuO/Si spin contact is determined by the interface band alignment. In particular, the band offset should fall within the 0.5-2 eV range. We employ soft-X-ray ARPES to probe the electronic structure of the buried EuO/Si interface with momentum resolution and chemical specificity. The band structure reveals a conduction band offset of 1.0 eV attesting the technological potential of the EuO/Si system.

Details

Database :
arXiv
Publication Type :
Report
Accession number :
edsarx.1603.04666
Document Type :
Working Paper