ZnCoO Films by Atomic Layer Deposition - influence of a growth temperature on uniformity of cobalt distribution

Authors :: Lukasiewicz, M. I.
Witkowski, B.
Godlewski, M.
Guziewicz, E.
Sawicki, M.
Paszkowicz, W.
Lusakowska, E.
Jakiela, R.
Krajewski, T.
Kowalik, I. A.
Kowalski, B. J.
Source :: Acta Physica Polonica A 116 (2009) 921-923
Publication Year :: 2011
Abstract: We report on the structural, electrical and magnetic properties of ZnCoO thin films grown by Atomic Layer Deposition (ALD) method using reactive organic precursors of zinc and cobalt. As a zinc precursor we applied either dimethylzinc or diethylzinc and cobalt (II) acetyloacetonate as a cobalt precursor. The use of these precursors allowed us the significant reduction of a growth temperature to 300oC and below, which proved to be very important for the growth of uniform films of ZnCoO. Structural, electrical and magnetic properties of the obtained ZnCoO layers will be discussed based on the results of SIMS, SEM, EDS, XRD, AFM, Hall effect and SQUID investigations.<br />Comment: 4 pages, 3 figures, 6 references

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