Fluorographene: Two Dimensional Counterpart of Teflon

Authors :: Nair, R. R.
Ren, W. C.
Jalil, R.
Riaz, I.
Kravets, V. G.
Britnell, L.
Blake, P.
Schedin, F.
Mayorov, A. S.
Yuan, S.
Katsnelson, M. I.
Cheng, H. M.
Strupinski, W.
Bulusheva, L. G.
Okotrub, A. V.
Grigorieva, I. V.
Grigorenko, A. N.
Novoselov, K. S.
Geim, A. K.
Source :: Small 6, 2877-2884 (2010)
Publication Year :: 2010
Abstract: We report a stoichiometric derivative of graphene with a fluorine atom attached to each carbon. Raman, optical, structural, micromechanical and transport studies show that the material is qualitatively different from the known graphene-based nonstoichiometric derivatives. Fluorographene is a high-quality insulator (resistivity >10^12 Ohm per square) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting Young's modulus of 100 N/m and sustaining strains of 15%. Fluorographene is inert and stable up to 400C even in air, similar to Teflon.<br />Comment: to appear in Small 2010