High-Performance On-Chip Supercapacitors Based on Mesoporous Silicon Coated with Ultrathin Atomic Layer-Deposited In

On-chip supercapacitors have attracted considerable attention because of their high power density, long cycling life, and compatibility with integrated circuits. One critical drawback that restricts their practical application is the low energy density. In this work, low-resistivity mesoporous silicon with a high aspect ratio is prepared by Pt film-assisted chemical etching and utilized as the scaffold of the supercapacitors. Subsequently, low-resistivity (0.0015 Ω·cm) and ultrathin In