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Non-contact XUV metrology of Ru/B
- Source :
- Applied optics. 57(6)
- Publication Year :
- 2018
-
Abstract
- Short-wavelength imaging, spectroscopy, and lithography scale down the characteristic length-scale to nanometers. This poses tight constraints on the optics finishing tolerances, which is often difficult to characterize. Indeed, even a tiny surface defect degrades the reflectivity and spatial projection of such optics. In this study, we demonstrate experimentally that a Hartmann wavefront sensor for extreme ultraviolet (XUV) wavelengths is an effective non-contact analytical method for inspecting the surface of multilayer optics. The experiment was carried out in a tabletop laboratory using a high-order harmonic generation as an XUV source. The wavefront sensor was used to measure the wavefront errors after the reflection of the XUV beam on a spherical Ru/B
Details
- ISSN :
- 15394522
- Volume :
- 57
- Issue :
- 6
- Database :
- OpenAIRE
- Journal :
- Applied optics
- Accession number :
- edsair.pmid..........c61464043759eec73be8bd82940b2c37