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Atomic Layer Deposition of In
- Source :
- ACS applied materialsinterfaces. 9(1)
- Publication Year :
- 2016
-
Abstract
- The atomic layer deposition (ALD) process of hydrogen-doped indium oxide (In
Details
- ISSN :
- 19448252
- Volume :
- 9
- Issue :
- 1
- Database :
- OpenAIRE
- Journal :
- ACS applied materialsinterfaces
- Accession number :
- edsair.pmid..........64802e9bea9359394ed5219c0856ccb6