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Rational design for high-yield monolayer WS

Authors :
Jun, Shen
Jiangbing, Yan
Li, Zhan
Chuanqiang, Wu
Binghui, Ge
Xu, Wang
Hongbing, Wang
Qilong, Cui
Dong, Yang
Hongling, Zhang
Xin, Zhang
Hengqing, Cui
Source :
Nanotechnology. 32(50)
Publication Year :
2021

Abstract

Tungsten Disulfide (WS

Details

ISSN :
13616528
Volume :
32
Issue :
50
Database :
OpenAIRE
Journal :
Nanotechnology
Accession number :
edsair.pmid..........5d9ed00913d20b5a929a6d7f9bd3c1fe

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