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Hetero-epitaxial growth of <tex>CoSi_{2}$</tex> thin films on Si(100) : template effects and epitaxial orientations

Authors :
Buschmann, V.
Rodewald, M.
Fuess, H.
Van Tendeloo, Gustaaf
Schaffer, C.
Source :
Journal of crystal growth
Publication Year :
1998

Abstract

This HREM investigation focuses on the influence of point defects on the final epitaxial relation and atomic interface configuration in a CoSi2/Si(1 0 0) heterostructure. A two-step SPE-MBE grown CoSi2/Si(1 0 0) system is used and, by altering the number of deposited Co monolayers in the template layer, the point defect behavior is studied. We propose a film growth model in which the knowledge about the reconstructed (2 x 1) : Si(1 0 0) surface, the point defect behavior in the presence of an interface, especially a silicide interface, the migration of point defects through a lattice by formation of [1 0 0]-split interstitial (dumbbell) atomic configurations, and a new type of extended defect configurations in diamond type materials will all amalgamate. (C) 1998 Published by Elsevier Science B.V. All rights reserved.

Subjects

Subjects :
Chemistry
Physics

Details

Language :
English
ISSN :
00220248
Database :
OpenAIRE
Journal :
Journal of crystal growth
Accession number :
edsair.od......2097..119c0b3703ffbc2e7e478b7afb6b802e