PHOTOEMISSION CHARACTERISTICS AND IN SITU KELVIN PROBE WORK FUNCTION MEASUREMENTS ON FILMS OF LINEAR CHAINED CARBON ON COPPER AND SILICON SUBSTRATES

Line-chain carbon films are a promising broadband material for use in devices; therefore, a deep understanding of the surface electronic structure is important. The Kelvin Probe (KP), Surface Photovoltage / Surface Photovoltage Technology (SPV / SPS), and Am-bient Air Emission Spectroscopy (APS) techniques are typically applied to conventional and organic semiconductor materials. In this study, measurements using a combination of KP, SPV / SPS, and APS methods take samples of linear-chain carbon films on copper and curved substrates to study their surface electronic structure and compare their various properties. These methods are non-contact and non-destructive. It was found that the position of the Fermi level of the samples does not change (4.83 ± 0.01 eV). The measured samples showed a good response to photoemission. Thus, the KP, SPV / SPS and APS measurement methods provided some interesting information about samples of linear-chain carbon films and an in-itial study of their surface electron states.