Degradation of polycrystalline HfO2-based gate dielectrics under nanoscale electrical stress

Subjects

Subjects :

Electric currents
Electrical properties
Dielectrics
Dielectric thin films
Leakage currents

Details

Database :

OpenAIRE

Accession number :

edsair.od.......272..866d5e733b40cc7e419ea857e932767b