Optimization of a single-step reactive ion etching process for InP photonic integration

Authors :: Jiao, Y.
Vries, de, T.
Shen, L.
Ambrosius, H.P.M.M.
Smit, M.K.
Tol, van der, J.J.G.M.
Photonic Integration
NanoLab@TU/e
Source :: Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 3-4 November 2014, Enschede, the Netherlands, 1-4, STARTPAGE=1;ENDPAGE=4;TITLE=Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 3-4 November 2014, Enschede, the Netherlands
Publication Year :: 2014

Language :: English
Database :: OpenAIRE
Journal :: Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 3-4 November 2014, Enschede, the Netherlands, 1-4, STARTPAGE=1;ENDPAGE=4;TITLE=Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 3-4 November 2014, Enschede, the Netherlands
Accession number :: edsair.narcis........b3fd8032c2c4f8e7acb7818c1421a343

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